What is the pulse power supply? The user's load needs to be powered intermittently, that is, according to a certain time rule, the load is energized for a certain period of time, and then the power is turned off for a certain period of time, and a cycle is formed by switching on and off. Repeatedly, the pulse power supply is constructed. For example, in the sophisticated process of a non-polar electrolytic capacitor, it is necessary to charge the capacitor for a period of time, then discharge, and then charge the capacitor for a period of time, then discharge, thus forming a positive → discharge (power off) → reverse → Discharge → forward..., so repeated.
　　 Pulse power supplies can be divided into single pulse power supplies and dual pulse power supplies.
1, single pulse power supply
Single-pulse power supply generally outputs a fixed one-way pulse current. If you want to change the pulse parameters, you need to reset it after stopping.
2, double pulse power supply
The double-pulse power supply generally outputs a fixed cycle commutating pulse current. If the pulse parameter is to be changed, the anode of the reverse pulse of the double-pulse power supply needs to be reset after shutdown to make the metal ion concentration on the cathode surface rise rapidly, which is beneficial to the subsequent The cathode period uses a high pulse current density, so the plating layer is dense, bright, and low in porosity; the reverse pulse anodic stripping of the double pulse power source greatly reduces the adhesion of organic impurities (including brightener) in the plating layer, and thus the plating layer has high purity. , strong resistance to color change. YS-9000 wing-lift intelligent pulse plating power supply provides a powerful means for the development and production of nano-plating technology.
Principle of pulsed power technology
Pulse power supply schematic
Pulse power supply In the pulse plating process, when the current is turned on, the pulse (peak) current is equivalent to several times or even several times of the ordinary DC current. It is this instantaneous high current density that causes the metal ion to be reduced at a very high overpotential. Therefore, the grain of the deposited layer is thinned; when the current is turned off, the discharge ions in the vicinity of the cathode region are restored to the initial concentration, and the concentration polarization is eliminated, which facilitates the continued use of a high pulse (peak) current density for the next pulse. At the same time, the shutdown period is accompanied by favorable recrystallization, adsorption and desorption of the sedimentary layer. Such a process runs through the entire plating process at the same time, and the mechanism involved constitutes the most basic principle of pulse plating. Practice has proved that the pulse power supply has incomparable superiority to traditional DC plating in refining crystallization, improving the physical and chemical properties of the coating, and saving precious metals.
First, through slow energy storage, the primary energy source has enough energy; then the intermediate energy storage and pulse shaping system is charged (or inflowing energy), and after some complicated processes such as storage, compression, pulse formation or transformation, the final rapid discharge Give the load.
The role of pulse power technology1 Increase the pulse repetition frequency: by increasing the repetition frequency of the pulse, not only the average power of the pulse power supply is increased, but also the volume of the power supply is reduced and the cost is reduced.
2 Improve power efficiency and reduce power consumption of the power supply.
3 Improve the reliability of the power system: pulse discharge heat generation and high frequency electromagnetic interference have a serious impact on system reliability.
High frequency pulse plating power supply
Pulse power supply is superior to traditional electroplating power supply and is the development direction of electroplating power supply.
When the pulse power source is used for electroplating gold, silver, nickel, tin, alloy, the functionality of the coating can be significantly improved; for protective-decorative plating (such as decorative gold), the coating color can be uniform, brightness, corrosion resistance Strong; used in the purification of precious metals, the purity of precious metals is higher.
The dual-pulse power supply is more detailed and smoother than the single-pulse power supply. The anodizing dissolution of the reverse pulse of the double-pulse power supply causes the metal ion concentration on the surface of the cathode to rise rapidly, which facilitates the use of a high pulse current density in the subsequent cathode cycle, so that the plating layer is dense, bright, and low in porosity; the reverse of the double-pulse power supply The anodic stripping of the pulse greatly reduces the adhesion of organic impurities (including brightener) in the plating layer, and thus the plating layer has high purity and strong resistance to discoloration.
Double pulse power supply is suitable for electroplating of gold, silver, rare metals, nickel, zinc, tin, chromium and alloys; electroforming of copper and nickel; application of electrolytic capacitors; anodizing of aluminum and titanium products; precision parts Electropolishing.
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